Containing more than 300 equations and nearly 500 drawings photographs and micrographs this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based critical dimension overlay acoustic film thickness dopant dose junction depth and electrical measurements; particle and defect detection; and flatness following chemical mechanical polishing. Providing examples of well-developed metrology capability the book focuses on metrology for lithography transistor capacitor and on-chip interconnect process technologies. |Handbook of Silicon Semiconductor Metrology | Materials & Chemical Engineering
